MICROELECTRONIC SYSTEMS NEWS

FILENUMBER: 1309 BEGIN_KEYWORDS 3D-IC PROCESS END_KEYWORDS DATE: June 2010 TITLE: 3D-IC PROCESS AVAILABLE VIA CMP/CMC/MOSIS
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TITLE: 3D-IC PROCESS AVAILABLE VIA CMP/CMC/MOSIS

CMP/CMC/MOSIS are partnering to offer a 3D-IC Multi-Project Wafer
service based on Tezzaron's SuperContact  technology  and  GLOBAL
FOUNDRIES 130-nm CMOS process.

The first MPW run is targeting January 2011.

For additional information, click here.

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