MICROELECTRONIC SYSTEMS NEWS
FILENUMBER: 9930
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TSMC 0.18-MICRON CMOS MOSIS
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DATE: July 2000
TITLE: TSMC 0.18-MICRON CMOS PROCESS AVAILABLE VIA MOSIS
================================================================= TITLE: TSMC 0.18-MICRON CMOS PROCESS AVAILABLE VIA MOSIS MOSIS is pleased to announce the availability of the TSMC 0.18 micron six metal, one poly process. Designs for this 1.8 / 3.3 V silicided process can use the TSMC native 0.18 micron design rules or the SCMOS rules (SCN6M_DEEP with lambda = 0.09 micron). For additional information, access: WWW =================================================================
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